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Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound

机译:包含异氰脲酸化合物与苯甲酸化合物反应产物的抗反射涂层形成组合物

摘要

There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.
机译:提供了一种抗反射涂层形成组合物,其包含具有两个或三个2,3-环氧丙基的异氰脲酸化合物与苯甲酸化合物的反应产物。由该组合物获得的抗反射涂层对反射光具有高的预防效果,不与光致抗蚀剂混合,可以在下部形成不具有立足点的光致抗蚀剂图案,并且可以通过使用例如光在光刻工艺中使用。 ArF准分子激光束和F2准分子激光束等

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