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COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND
COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND
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机译:包含抗异氰酸酯膜和苯甲酸的反应产物的抗反光膜形成组合物
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摘要
There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.
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