首页> 外国专利> Methods of Processing Substrates, Electrostatic Carriers for Retaining Substrates for Processing, and Assemblies Comprising Electrostatic Carriers Having Substrates Electrostatically Bonded Thereto

Methods of Processing Substrates, Electrostatic Carriers for Retaining Substrates for Processing, and Assemblies Comprising Electrostatic Carriers Having Substrates Electrostatically Bonded Thereto

机译:基板的处理方法,用于保留基板以进行处理的静电载体以及包括具有静电键合了基板的静电载体的组件

摘要

A method of processing a substrate includes physically contacting an exposed conductive electrode of an electrostatic carrier with a conductor to electrostatically bond a substrate to the electrostatic carrier. The conductor is removed from physically contacting the exposed conductive electrode. Dielectric material is applied over the conductive electrode. The substrate is treated while it is electrostatically bonded to the electrostatic carrier. In one embodiment, a conductor is forced through dielectric material that is received over a conductive electrode of an electrostatic carrier to physically contact the conductor with the conductive electrode to electrostatically bond a substrate to the electrostatic carrier. After removing the conductor from the dielectric material, the substrate is treated while it is electrostatically bonded to the electrostatic carrier. Electrostatic carriers for retaining substrates for processing, and such assemblies, are also disclosed.
机译:一种处理基板的方法,包括使静电载体的暴露的导电电极与导体物理接触,以将基板静电结合至静电载体。从物理接触暴露的导电电极上除去导体。将介电材料施加在导电电极上。在基材静电结合到静电载体上的同时对其进行处理。在一个实施例中,迫使导体穿过介电材料,该介电材料被接收在静电载体的导电电极上,以使导体与导电电极物理接触,以将基板静电结合到静电载体。从介电材料中去除导体后,在将衬底静电结合到静电载体上的同时对其进行处理。还公开了用于保持用于处理的基板的静电载体以及这种组件。

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