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Distributed Feedback Semiconductor Laser Based on Reconstruction-Equivalent-Chirp Technology and the Manufacture Method of the Same

机译:基于重构等效Chi技术的分布式反馈半导体激光器及其制造方法

摘要

Using sampled Bragg grating structure, the present invention proposes a distributed feedback (DFB) semiconductor laser based on reconstruction-equivalent-chirp technology. Namely, the Bragg grating in the said DFB semiconductor laser cavity is a sampled Bragg grating, in which there is an equivalent grating corresponding to the original ordinary DFB grating as feedback for lasing. The laser wavelength of the said semiconductor laser located within the operation bandwidth of the said equivalent grating. The said equivalent grating is designed and fabricated using REC technology and has equivalent chirps, one equivalent phase shift or multiple equivalent phase shifts. The said sampled Bragg grating has multiple ghost gratings and the wavelength spacing between neighboring ghost gratings is inversely proportional to the sampling period and the effective refractive index of the said semiconductor laser. Only one ghost grating except the ghost grating related to the center wavelength is selected to be as equivalent grating. In semiconductor laser fields, only based on sub-micron precision, the present invention provides a method to realize various complex equivalent chirps and equivalent phase shifts in the resonant cavity of the said semiconductor laser. These equivalent chirps and equivalent phase shifts have the same functions with the corresponding true chirps and true phase shifts, so as to avoid the processes of fabrication of grating structure with complex true chirps and true phase shifts.
机译:利用采样的布拉格光栅结构,本发明提出了一种基于重建等效chi技术的分布式反馈(DFB)半导体激光器。即,在所述DFB半导体激光腔中的布拉格光栅是采样布拉格光栅,其中存在与原始普通DFB光栅相对应的等效光栅作为激光发射的反馈。所述半导体激光器的激光波长位于所述等效光栅的工作带宽内。所述等效光栅是使用REC技术设计和制造的,并且具有等效chi,一个等效相移或多个等效相移。所述采样布拉格光栅具有多个重影光栅,并且相邻重影光栅之间的波长间隔与所述半导体激光器的采样周期和有效折射率成反比。除了与中心波长有关的重影光栅之外,仅选择一个重影光栅作为等效光栅。在半导体激光领域中,仅基于亚微米精度,本发明提供了一种在所述半导体激光器的谐振腔中实现各种复杂的等效chi和等效相移的方法。这些等效chi和等效相移具有与对应的真实chi和真实相移相同的功能,从而避免了制造具有复杂真实chi和真实相移的光栅结构的过程。

著录项

  • 公开/公告号US2009010295A1

    专利类型

  • 公开/公告日2009-01-08

    原文格式PDF

  • 申请/专利权人 XIANGFEI CHEN;

    申请/专利号US20070281765

  • 发明设计人 XIANGFEI CHEN;

    申请日2007-02-25

  • 分类号H01S3/08;H01S5/00;

  • 国家 US

  • 入库时间 2022-08-21 19:30:10

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