FLAT PLATE CONVEYER FURNACE FOR APCVD DEPOSITION TIO2

摘要

FLAT PLATE CONVEYER FURNANCE SYSTEM FOR APCVD DEPOSITION OF TiO2 The invention provides a flat plate conveyer furnace system for obtaining better uniformity of heating and deposition of the APCVD deposited film, and in particular for deposition of TiO2 file, comprising of a drive arrangement provided with Spur gear and Chain system for the desired horizontal movement of the said flat plate conveyer at the upper level, flat bars being selectively attached to alternate links of the said chain system and metal plates attached to said alternate flat bars, wherein the links between said chain system and flat bars are configured to provide support to said plates from its bottom by means of two flat bars at the back and front side of the plate respectively, the said flat bars being providing support to said plate to keep the plate horizontal and to maintain uniform distance from the injection head facilitating deposition of uniform film thickness.