首页> 外国专利> Object displacement measuring device for seismograph application, involves calculating movement of object relative to optical axis from measured displacement of interference pattern

Object displacement measuring device for seismograph application, involves calculating movement of object relative to optical axis from measured displacement of interference pattern

机译:用于地震仪的物体位移测量装置,涉及从所测量的干涉图案的位移计算物体相对于光轴的运动

摘要

The method involves providing a radiation source (10) e.g. laser, and a radiation sensor (30) at a distance in a measuring site (B). An object associated with a pattern-making body (20) is positioned between the source and the sensor, and a radiation beam (11) is directed to the sensor, where diffraction of the radiation causes an interference pattern (31) on the sensor. A relative displacement of the pattern is measured relative to the sensor, and the movement of the object relative to an optical axis is calculated from the measured displacement of the interference pattern. Independent claims are also included for the following: (1) a device for measuring a displacement of an object relative to a reference (2) a kit for a device for measuring a displacement of an object relative to a reference.
机译:该方法包括提供辐射源(10),例如辐射源。激光和辐射传感器(30)在测量部位(B)的一定距离处。与图案形成体(20)相关联的物体位于源和传感器之间,并且辐射束(11)被引导至传感器,其中辐射的衍射在传感器上引起干涉图案(31)。测量图案相对于传感器的相对位移,并且根据所测量的干涉图案的位移来计算物体相对于光轴的运动。还包括以下方面的独立权利要求:(1)一种用于测量物体相对于参考物的位移的设备(2)一种用于测量物体相对于参考物的位移的设备的套件。

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