首页> 外国专利> METHOD AND APPARATUS FOR SINGLE-POLARITY CHARGE SENSING FOR SEMICONDUCTOR RADIATION DETECTORS DEPOSITED BY PHYSICAL VAPOR DEPOSITION TECHNIQUES

METHOD AND APPARATUS FOR SINGLE-POLARITY CHARGE SENSING FOR SEMICONDUCTOR RADIATION DETECTORS DEPOSITED BY PHYSICAL VAPOR DEPOSITION TECHNIQUES

机译:物理气相沉积技术沉积的半导体辐射探测器的单极性电荷感测方法和装置

摘要

A system for improving the resolution of semiconductor based radiationdetectors deposited via physical vapor deposition(PVD) techniques (e.g. evaporation or sputtering such as amorphous Selenium,.alpha.-Se, Mercury Iodide, HgI2, Lead Oxide,PbO) which exhibit poor transport properties for either electrons or holes(depending on the type of the detector) due tosignificant carrier trapping. An additional electrical grid is establishedwithin the semiconductor between the top andbottom electrodes. The intermediate grid is biased at an appropriate potentialto eliminate the variation in the inducedcharge on photon interaction depth inside the detector volume. The proposedmethod improves the resolution and thesignal-to-noise ratio of the detector system and enables large-area pixelatedarray designs. The proposed hybrid readoutmethod also enables the design of low-noise readout electronics incomplementary metal-oxide semiconductor (CMOS)technologies for large area applications.
机译:一种用于提高基于半导体的辐射的分辨率的系统通过物理气相沉积法沉积的检测器(PVD)技术(例如蒸发或溅射,例如非晶硒,α-Se,碘化汞,HgI2,氧化铅,PbO)对电子或空穴的传输性能较差(取决于检测器的类型)明显的载流子捕获。建立了额外的电网在顶部和顶部之间的半导体内底部电极。中间栅极偏置在适当的电位消除引起的变化在探测器体积内的光子相互作用深度上带电。建议方法提高了分辨率,并且探测器系统的信噪比,并实现大面积像素化阵列设计。建议的混合读数该方法还可以设计低噪声读出电子器件互补金属氧化物半导体(CMOS)大面积应用的技术。

著录项

  • 公开/公告号CA2615827A1

    专利类型

  • 公开/公告日2009-07-22

    原文格式PDF

  • 申请/专利权人 KARIM KARIM S.;GOLDAN AMIRHOSSEIN;

    申请/专利号CA20082615827

  • 发明设计人 GOLDAN AMIRHOSSEIN;KARIM KARIM S.;

    申请日2008-01-22

  • 分类号H01L21/06;G01T1/24;H01L31/0272;H01L31/115;

  • 国家 CA

  • 入库时间 2022-08-21 19:23:19

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