METHOD OF PREVENTING DETACHMENT OF DEPOSITED FILM ON SUBSTRATE RETENTION TOOL IN THIN-FILM FORMING APPARATUS AND THIN-FILM FORMING APPARATUS

摘要

On a return traveling passage between unload lock chamber (2) for recovering substrate (9) after film formation from substrate retention tool (90) and load lock chamber (1) for mounting substrate (9) before film formation on the substrate retention tool (90), film detachment preventing chamber (710) is airtightly connected to the unload lock chamber (2) and the load lock chamber (1). The film detachment preventing chamber (710) thereinside is provided with film coating means for coating on the deposition film of the surfaces of substrate retention tool (90) and retention claw (91).