首页> 外国专利> METHOD FOR FORMING FINE COPPER PARTICLE SINTERED PRODUCT TYPE OF ELECTRIC CONDUCTOR HAVING FINE SHAPE, METHOD FOR FORMING FINE COPPER WIRING AND THIN COPPER FILM USING SAID METHOD

METHOD FOR FORMING FINE COPPER PARTICLE SINTERED PRODUCT TYPE OF ELECTRIC CONDUCTOR HAVING FINE SHAPE, METHOD FOR FORMING FINE COPPER WIRING AND THIN COPPER FILM USING SAID METHOD

机译:具有细形状的导体的细铜颗粒烧结产品类型的形成方法,利用所述方法形成细铜布线和薄铜膜的方法

摘要

The present invention provides a process for forming a copper fine particle sintered product type of a fine-shaped electric conductor showing superior electroconductivity, which comprises steps of drawing a fine pattern with the use of a dispersion containing the copper fine particles having a surface oxide film layer, conducting a treatment for reducing the copper fine particles with the surface oxide film layer or copper oxide fine particles included in the pattern at a comparatively low temperature, and baking the resultant copper fine particles. Specifically, the process carries out the processes of; applying a dispersion containing the copper fine particles having the surface oxide film layer thereon or the copper oxide fine particles with an average particle diameter of 10 µm or smaller onto a substrate; and then performing a series of the heat treatment steps of heating the particles in the coated layer at temperature of 350°C or lower under an atmosphere containing a vapor and a gas of a compound having reducibility to reduce the oxide film by a reduction reaction which used the compound having reducibility as a reducing agent, subsequently repeating a heat treatment combining an oxidizing treatment of a short time with a re-reducing treatment, and sintering the resultant copper fine particles with each other to form a layer of the sintered product.
机译:本发明提供了形成导电性优异的细小形状的导电体的铜微粒烧结体类型的方法,其包括使用包含具有表面氧化膜的铜微粒的分散液来绘制精细图案的步骤。在相对低的温度下,进行处理以在相对较低的温度下用图案中包括的表面氧化物膜层或图案中包括的氧化铜微粒还原铜微粒,并烘烤所得的铜微粒。具体地,该过程执行以下过程:将包含其上具有表面氧化物膜层的铜微粒或平均粒径为10μm或更小的铜氧化物微粒的分散体施加到基板上;然后进行一系列的热处理步骤,在含有蒸气和具有还原性的化合物的气体的气氛下,在350℃或更低的温度下,将被覆层中的颗粒加热至350℃以下,以通过还原反应还原氧化膜。将具有还原性的化合物用作还原剂,随后重复将短时间的氧化处理与还原处理相结合的热处理,并将所得的铜微粒彼此烧结以形成烧结产物层。

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