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FLUID PATHS IN ETCHABLE MATERIALS

机译:可摘材料中的流体路径

摘要

The invention relates to fluid paths in etchable materials. Fluid paths are formed by forming a cavity through a substrate material with a first dry removal process to produce a first surface of the cavity. The first surface of the cavity is associated with a first roughness. The first surface of the cavity is etched with a second wet removal process to reduce the first roughness and produce a second roughness associated with the first surface of the cavity. A coating is applied to the first surface of the cavity to produce a second surface to improve wettability of the first or second surface of the cavity, reduce in size or number gas nucleation sites in the first or second surface of the cavity, reduce the amount of debris associated with the first roughness carried by the fluid flow, and/or improve hydrophilicity of the first or second surface.
机译:本发明涉及可蚀刻材料中的流体路径。通过使用第一干法去除工艺形成穿过基底材料的腔来形成流体路径,以产生腔的第一表面。腔的第一表面具有第一粗糙度。用第二湿法去除工艺蚀刻腔的第一表面,以减小第一粗糙度并产生与腔的第一表面相关的第二粗糙度。将涂层施加到空腔的第一表面上以产生第二表面,以改善空腔的第一或第二表面的可润湿性,减小空腔的第一或第二表面中的气体成核部位的尺寸或数量,减少量与由流体流携带的第一粗糙度相关的碎屑,和/或改善第一或第二表面的亲水性。

著录项

  • 公开/公告号EP2091648A2

    专利类型

  • 公开/公告日2009-08-26

    原文格式PDF

  • 申请/专利权人 BIOSCALE INC.;

    申请/专利号EP20070864582

  • 申请日2007-11-19

  • 分类号B01L3/00;B81C1/00;

  • 国家 EP

  • 入库时间 2022-08-21 19:15:02

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