METHOD OF CLEANING A PATTERNING DEVICE, METHOD OF DEPOSITING A LAYER SYSTEM ON A SUBSTRATE, SYSTEM FOR CLEANING A PATTERNING DEVICE, AND COATING SYSTEM FOR DEPOSITING A LAYER SYSTEM ON A SUBSTRATE

摘要

A method and system for washing a patterning device and method and the coating system laminating layer system on the substrate are provided to obtain a short cycle time without the suitable increment of the mask temperature so that the successive operation of the OLED coating equipment is achieved. A method for washing a patterning device comprises a step for supplying cleansing plasma in order to remove coating materials from the patterning device by plasma etching processes. The plasma used to remove the coating material from the patterning device is generated by activating the working gas for producing the plasma in the activation zone(2) and the patterning device is located outside the activation zone for the processing removing the coating material from the patterning device.