首页> 外国专利> DETERMINING PROFILE PARAMETERS OF A STRUCTURE USING APPROXIMATION AND FINE DIFFRACTION MODELS IN OPTICAL METROLOGY

DETERMINING PROFILE PARAMETERS OF A STRUCTURE USING APPROXIMATION AND FINE DIFFRACTION MODELS IN OPTICAL METROLOGY

机译:用光学计量学中的近似和精细衍射模型确定结构的轮廓参数

摘要

A method for determining profile parameters of structure is provided to accurately determine the profile of structure by using the profile model which accurately characterizes structure. The simulated approximation diffraction signal is generated based on the approximation diffraction model of structure. The approximation diffraction signal simulated from simulated precision diffraction signals is subtracted and the set of differential diffraction signals is obtained(710). Differential diffraction signals are coupled with profile parameters and then produce the library. The measured diffraction signal which is adjusted by the simulated approximation diffraction signal is matched to the library to determine one or more profile parameters of structure(724).
机译:提供了一种用于确定结构的轮廓参数的方法,以通过使用精确表征结构的轮廓模型来准确地确定结构的轮廓。基于结构的近似衍射模型生成模拟的近似衍射信号。从模拟精密衍射信号中模拟得到的近似衍射信号被减去,得到一组差分衍射信号(710)。微分衍射信号与轮廓参数耦合,然后生成库。通过模拟近似衍射信号调节的测量衍射信号与该库匹配以确定结构的一个或多个轮廓参数(724)。

著录项

  • 公开/公告号KR20090023248A

    专利类型

  • 公开/公告日2009-03-04

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号KR20080084778

  • 发明设计人 YANG WEIDONG;LIU WEI;LI SHIFANG;

    申请日2008-08-28

  • 分类号H01L21/66;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 19:13:53

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