RADIATION CURABLE AND DEVELOPABLE POLYURETHANE AND RADIATION CURABLE AND DEVELOPABLE PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

A polyurethane capable of being cured and developed by the irradiation of radioactive rays, and a photoresist composition containing the polyurethane are provided to improve chemical resistance and heat resistance after the formation of film. A polyurethane capable of being cured and developed by the irradiation of radioactive rays has a carboxylic acid group at the main chain, an acryloyl group and a carboxylic acid group at the side chain, and comprises the random arrangement of the repeating units I, II and III represented by the formulas I, II and III, wherein R1 is a linear or branched alkylene group of C1-12, a C3-8 cyclic alkylene group, a phenylene group, a biphenylene group, a naphthylene group, a xylene group, a toluidinylene group, or -Ph-A-Ph-, and the group may have a C1-6 alkyl group as a substituent; R2 is a divalent aliphatic group capable of at least one OH group; and R3 is a linear or branched C1-6 alkyl group having at least one OH group.