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Method of measuring the degree of partial coherence in semiconductor lithographic system
Method of measuring the degree of partial coherence in semiconductor lithographic system
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机译:半导体光刻系统中部分相干度的测量方法
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摘要
PURPOSE: A method for measuring the degree of partial coherence in a semiconductor lithographic apparatus is provided to be capable of improving the simulation accuracy and trouble shooting. CONSTITUTION: Exposure processing is performed by using an exposing mask. At this time, the exposing mask is provided with a phase shifting lattice pattern(51) at a transmission region of pin-hole shape. That is, by using the phase shifting lattice pattern(51), the degree of partial coherence in the exposure processing is measured. Preferably, the diameter of the pin-hole is 10-1000 micrometer.
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