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Conference on optical microlithography XXIII

召开年：2010
召开地：San Jose, CA(US)
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1.Stepwise fitting methodology for Optical Proximity Correction modeling

机译：光学邻近校正建模的逐步拟合方法
- 作者：Artak Isoyan;Jianliang Li;Lawrence S. Melvin III
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- OPC;
- modeling;
2.Achieving Interferometric Double Patterning through Wafer Rotation

机译：通过晶圆旋转实现干涉双图案
- 作者：Peng Xie;Neal V. Lafferty;Bruce W. Smith
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- interferometric lithography;
- double patterning;
- wafer rotation;
- alignment;
3.Partial spatial coherence in an excimer-laser lithographic imaging system

机译：准分子激光光刻成像系统中的部分空间相干性
- 作者：Arlene Smith;Anna Burvall;Christopher Dainty
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- partial coherence;
- excimer;
- elementary function;
- imaging;
4.Methods for assessing empirical model parameters and calibration pattern measurements

机译：评估经验模型参数和校准图案测量的方法
- 作者：Xin Zhou;Eldar Khaliullin;Lan Luan
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- model calibration;
- model effectiveness;
- Fisher Information Matrix;
- Cramer-Rao Lower Bound;
5.Comparison of OPC models with and without 3D-mask effect

机译：具有和不具有3D蒙版效果的OPC模型的比较
- 作者：Jung-Hoon Ser;Tae-Hoon Park;Moon-Gyu Jeong;Eun-Mi Lee;Sung-Woo Lee;Chun-Suk Suh;Seong-Woon Choi;Chan-Hoon Park;Joo-Tae Moon
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- OPC model;
- 3D mask;
- thick mask;
6.Self-Aligned Double Patterning Process for 32/32nm Contact/Space and beyond using 193 Immersion Lithography

机译：使用193浸没式光刻技术，用于32 / 32nm接触/空间及更大范围的自对准双图案化工艺
- 作者：Bencherki Mebarki;Liyan Miao;Yongmei Chen;James Yu;Pokhui Blanco;James Makeeff;Jen Shu;Christoher Bencher;Mehul Naik;Christopher Sui Wing Ngai
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- contact;
- patterning;
- lithography;
- self-aligned;
- spacer;
- core;
- frequency doubling;
7.Study of Model based etch bias retarget for OPC

机译：基于模型的OPC蚀刻偏压重定位研究
- 作者：Qingwei Liu;Renqiang_Cheng;Liguo Zhang
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- model-based;
- etch bias;
- RET;
- OPC;
- calibre;
8.Impact of Illumination on Model -Based SRAF Placement for Contact Patterning

机译：照明对基于模型的SRAF接触图案放置的影响
- 作者：John L. Sturtevant;Srividya Jayaram;Omar El-Sewefy;Aasutosh Dave;Pat LaCour
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- illumination;
- simulation;
- PV Band;
- SRAF;
9.High Reliability ArF Light Source for Double Patterning Immersion Lithography

机译：用于双图案浸没式光刻的高可靠性ArF光源
- 作者：Rostislav Rokitski;Toshi Ishihara;Rajeskar Rao;Rui Jiang;Mary Haviland;Theodore Cacouris;Daniel Brown
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- immersion lithography;
- double patterning;
- excimer laser;
- deep ultraviolet;
10.Pattern deformation caused by deformed pellicle with ArF exposure

机译：暴露在ArF中的薄膜变形导致的图案变形
- 作者：Jee-Hye You;Ilsin An;Hye-Keun Oh
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
11.Inter-layer Self-Aligning Process for 22nm Logic

机译：22nm逻辑的层间自对准工艺
- 作者：Michael C. Smayling;Stewart Robertson;Damian Lacey;Sanjay Kapasi
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- gridded design rules;
- restricted design rules;
- self-aligned structures;
12.Novel continuously shaped diffractive optical elements enable high efficiency beam shaping

机译：新型连续成形的衍射光学元件可实现高效光束整形
- 作者：Yuri V. Miklyaev;Waleri Imgrunt;Vladimir S. Pavelyev;Denis G. Kachalov;Tanja Bizjak;Lutz Aschke;Vitalij N. Lissotschenko
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
13.Study for lithography techniques of hybrid mask shape of contact hole with 1.35NA polarized illumination for 28nm-node and below logic LSI

机译：用于28nm节点及以下逻辑LSI的1.35NA偏振照明的接触孔混合掩模形状的光刻技术研究
- 作者：Yuji Setta;Katsuyoshi Kobayashi;Tatsuo Chijimatsu;Satoru Asai
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- low kl lithography;
- contact-hole;
- polarization;
14.A Non-Delta-Chrome OPC Methodology for Process Models with Three-Dimensional Mask Effects

机译：具有三维蒙版效果的过程模型的非Delta-Chrome OPC方法论
- 作者：Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence Melvin
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- optical proximity correction;
- three-dimensional mask effects;
- nonlinearity;
- feedback compensation;
15.Methods for Benchmarking Photolithography Simulators: Part V

机译：标定光刻模拟器的方法：第五部分
- 作者：Trey Graves;Mark D. Smith;Sanjay Kapasi
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- lithography simulation;
- numerical accuracy;
- image intensity;
- post-exposure bake;
- PROLITH;
16.Improvement in Process Window Aware OPC

机译：改进过程窗口感知OPC
- 作者：Xiaohai Li;Yasushi Kojima;Hironobu Taoka;Akemi Moniwa;Matt St. John;Yang Ping;Randall Brown;Robert Lugg;Sooryong Lee
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- optical proximity correction (OPC);
- process window;
- process window aware OPC (PWA-OPC);
17.A New Etch-Aware After Development Inspection (ADI) Technique for OPC Modeling

机译：用于OPC建模的新的蚀刻后检测检查（ADI）技术
- 作者：Jing Xue;Jason Huang;Aram Kazarian;Brad Falch
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- etch bias;
- after development inspection (ADI);
- after etch inspection (AEI);
- staged model;
- retarget model;
- OPC modeling;
18.Improved Process Window Modeling Techniques

机译：改进的过程窗口建模技术
- 作者：Christian Zuniga;Tamer Tawfik
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- lithography;
- OPC model;
- process window;
- calibration;
- Bossung;
- focus;
19.A Novel Decomposition of Source Kernel for OPC Modeling

机译：用于OPC建模的源内核的新型分解
- 作者：C.T. Hsuan;T.S. Wu;Fred Lo;Elvis Yang;T. H. Yang;K. C. Chen;Chih-Yuan Lu
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- OPC;
- ideal source;
- KIF;
- measured source;
- decomposed source;
- model accuracy;
- runtime;
20.A Novel Method to Reduce Wafer Topography Effect for Implant Lithography Process

机译：减少植入光刻工艺中晶片形貌效应的新方法
- 作者：Lei Yuan;Sanggil Bae;Yong Feng Fu;Ao Chen;Hui Peng Koh;Qun Ying Lin
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- wafer topography;
- implant lithography;
- sub-resolution feature;
- lithography simulation;
21.Immersion BARC for Hyper NA Applications II

机译：适用于Hyper NA应用的浸入式BARC II
- 作者：Yu-Chin Huang;Kai-Lin Chuang;Tsung-Ju Yeh;Steven Wu;Bill Lin;Wen-Liang Huang;Bo-Jou Lu;E.T. Liu;Chun Chi Yu;Chaoyang Lin;Jeong Yun Yu;Greg Prokopowicz;Sue Ryeon Kim;Sabrina Wong;George Barclay
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- immersion lithography;
- Reflectivity control;
- Substrate effect;
22.Examining Reflectivity Criterion for Various ArF Lithography

机译：检查各种ArF光刻的反射率准则
- 作者：Meng-Feng Tsai;Chia-Chi Lin;Wei-Chun Chao;Chan-Tsun Wu;Jun-Cheng Lai
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- reflection;
- ArF;
- BARC (bottom anti-reflection coating);
- RET (Resolution Enhancement Technology);
23.CD-Uniformity for 45nm NV Memory on product-stack

机译：产品堆栈上45nm NV存储器的CD一致性
- 作者：Umberto Iessi;Brian Colombo;Johannes Plauth;Benedetta Triulzi;Elio De Chiara;Paolo Canestrari
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- CD uniformity;
- dose mapper;
- agile;
- LithoCruiser;
- CDU predictor;
24.Laser Spectrum Requirements for Tight CD Control at Advanced Logic Technology Nodes

机译：先进逻辑技术节点上严格CD控制的激光光谱要求
- 作者：R. C. Peng;H. J. Lee;John Lin;Arthur Lin;Allen Chang;Benjamin Szu-Min Lin
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- CD control;
- laser parameter;
- laser spectrum;
- photolithography simulation;
25.Wafer LMC Accuracy Improvement by Adding Mask Model

机译：通过添加掩模模型来提高晶圆LMC精度
- 作者：Wei Cyuan Lo;Yung Feng Cheng;Ming Jui Chen;Peter Huang;Stephen Chang;Eiji Tsujimoto
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- mask model;
- poly;
- 45nm;
- verification;
- simulation;
26.Aerial image model and application to aberration measurement

机译：航空影像模型及其在像差测量中的应用
- 作者：Anatoly Y. Burov;Liang Li;Zhiyong Yang;Fan Wang;Lifeng Duan
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- wavefront error;
- zernike coefficient;
- aerial image;
- bananicity;
27.CDU linear model based on aerial image principal components

机译：基于航空影像主成分的CDU线性模型
- 作者：Zhiyong Yang;Anatoly Y. Burov;Liang Li;Fan Wang;Zhaoxiang Chu
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- CDU linear model;
- Zernike coefficient;
- Bossung curve;
- process window;
28.Selective Inverse Lithography Methodology

机译：选择性反光刻技术
- 作者：ChinTeong Lim;Vlad Temchenko;Martin Niehoff
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
29.Lithography Cycle Time Improvements Using Short-Interval Scheduling

机译：使用短间隔计划改进光刻周期时间
- 作者：David Norman;Scott Watson;Michael Anderson;Steve Marteney;Ben Mehr
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
30.Advances in DOE modeling and optical performance for SMO applications

机译：用于SMO应用的DOE建模和光学性能方面的进展
- 作者：James Carriere;Jared Stack;John Childers;Kevin Welch;Marc D. Himel
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- DOE;
- diffractive optical element;
- diffuser;
- off-axis illumination;
- source mask optimization;
- tunable;
31.Modeling of CD and placement error in multi-spacer patterning technology

机译：多垫片图形技术中的CD建模和放置错误
- 作者：S. Babin;K. Bay
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- spacer patterning technology;
- SPT;
- self aligned double patterning;
- SADP;
- dry etch;
- film deposition;
- etch profile;
- CD variation;
- microloading;
- placement error;
32.Process Window and Integration Results for Full-Chip Model-Based Assist-Feature Placement at the 32 nm Node And Below

机译：基于全芯片模型的辅助功能在32 nm节点及以下节点的处理窗口和集成结果
- 作者：Ji Li;Gerry Luk-Pat;Amyn Poonawala;Kevin Lucas;Ben Painter
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
33.Novel ATHENA Mark Design to Enhance Alignment Quality in Double Patterning with Spacer Process

机译：新颖的ATHENA标记设计，可通过间隔条工艺在双图案中提高对准质量
- 作者：L.W. Chen;Mars Yang;Elvis Yang;T. H. Yang;K. C. Chen;Chin-Yuan Lu
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- DPS;
- VSPM;
- alignment;
- WQ;
- MCC;
- ROPI;
- overlay;
34.Optimization on Illumination Source with Design of Experiments

机译：实验设计优化光源
- 作者：Helen Hu;Yi Zou;Yunfei Deng
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- source optimization;
- illumination;
- DOE;
- response surface methodology;
35.Analysis of Photoresist Edge Bead Removal Using Laser Light and Gas

机译：激光和气体去除光刻胶边缘珠的分析
- 作者：V. Chaplick;E. Degenkolb;D. Elliott;K. Harte;R. Millman Jr.;M. Tardif
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- defectively;
- edge bead;
- edge exclusion;
- apex;
- fluence;
- laser;
36.Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

机译：灵活可靠的高功率注入锁定激光器，可进行两次曝光和两次构图的ArF浸没式光刻
- 作者：Masaya Yoshino;Hiroshi Umeda;Hiroaki Tsushima;Hidenori Watanabe;Satoshi Tanaka;Shinich Matsumoto;Takashi Onose;Hiroyuki Nogawa;Yasufumi Kawasuji;Takashi Matsunaga;Junichi Fujimoto;Hakaru Mizoguchi
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- 32nm node;
- ArF excimer laser;
- Injection Lock;
- line narrow;
- 193nm lithography;
- Immersion;
- spectrum bandwidth;
- high power;
37.Applications of MoSi-based Binary Intensity Mask for Sub-40nm DRAM

机译：基于MoSi的二元强度掩模在40nm以下DRAM中的应用
- 作者：Tae-Seung Eom;Eun-Kyoung Shin;Eun-Ha Lee;Yoon-Jung Ryu;Jun-Taek Park;Sunyoung Koo;Hye-Jin Shin;Seung-Hyun Hwang;Hee-Youl Lim;Sarohan Park;Kyu-Tae Sun;Noh-Jung Kwak;Sungki Park
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- polarization;
- Hyper-NA immersion lithography;
- MoSi-based BIM;
- att.PSM;
- DRAM;
38.OMOG Mask Topography Effect on Lithography Modeling of 32nm Contact Hole Patterning

机译：OMOG掩模的地形对32nm接触孔图案化光刻建模的影响
- 作者：Lei Yuan;Wenzhan Zhou;Larry L. Zhuang;Kwang Sub Yoon;Qun Ying Lin;Scott Mansfield
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- opaque MoSi on glass;
- MoSi binary mask;
- OMOG;
- lithography modeling;
- mask topography;
- contact hole;
39.Toward a Consistent and Accurate Approach to Modeling Projection Optics

机译：寻求一致且准确的投影光学建模方法
- 作者：Danping Peng;Peter Hu;Vikram Tolani;Thuc Dam
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- abbe;
- Hopkins;
- Maxwell equation;
- vector optics;
- scalar optics;
- polarization;
- partial coherent;
- lithography simulation;
40.Abbe-PCA-SMO : Microlithography Source and Mask Optimization Based on Abbe-PCA

机译：Abbe-PCA-SMO：基于Abbe-PCA的微光刻源和掩模优化
- 作者：Jason Hsih-Chie Chang;Charlie Chung-Ping Chen;Lawrence S. Melvin III
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
41.Source-mask optimization (SMO): from theory to practice

机译：源掩码优化（SMO）：从理论到实践
- 作者：Thuc Dam;Vikram Tolani;Peter Hu;Ki-Ho Baik;Linyong Pang;Bob Gleason;Steven D. Slonaker;Jacek K. Tyminski
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- SMO;
- ILT;
- OPC;
- optical aberrations;
- scanner aberrations;
- Zernike aberrations;
- Jones pupil aberrations;
42.Performance ofFlexRay, a fully programmable Illumination system for generation of Freeform Sources on high NA immersion systems

机译：FlexRay的性能，这是一个完全可编程的照明系统，可在高NA浸没系统上生成自由形式的光源
- 作者：Melchior Mulder;Andre Engelen;Oscar Noordman;Gert Streutker;Bert van Drieenhuizen;Cas van Nuenen;Wilfred Endendijk;Jef Verbeeck;Wim Bouman;Anita Bouma;Robert Kazinczi;Robert Socha;Dirk Juergens;Joerg Zimmermann;Bastian Trauter;Joost Bekaert;Bart Laenens;Daniel Corliss;Greg McIntyre
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- programmable illuminator;
- FlexRay;
- freeform sources;
- source mask optimization;
43.Experimental Study of Effect of Pellicle on optical Proximity Fingerprint for 1.35 NA immersion ArF Lithography

机译：膜片对1.35 NA浸没ArF光刻技术的光学接近指纹影响的实验研究
- 作者：Lieve Van Look;Joost Bekaert;Bart Laenens;Geert Vandenberghe;Jan Richter;Karsten Bubke;Jan Hendrik Peters;Koen Schreel;Mircea Dusa
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- pellicle;
- optical proximity;
- Jones Pupil;
- CDU;
- pellicle thickness uniformity;
44.Methods and Challenges to extend existing dry 193nm medium NA lithography beyond 90nm

机译：将现有的193nm干式NA光刻技术扩展到90nm以上的方法和挑战
- 作者：Jens Schneider;Andreas Greiner;ChinTeong Lim;Vlad Temchenko;Felix Braun;Dieter Kaiser;Tarja Hauck;Ingo Meusel;Dietrich Burmeister;Stephan Loehr;Susanne Volkland;Astrid Bauch;Hendrik Kirbach;Daniel Sarlette;Katrin Thiede
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- sub 90nm;
- chemical shrink;
- dry 193nm;
- medium NA;
45.Lithography Light Source Fault Detection

机译：光刻光源故障检测
- 作者：Matthew Graham;Erica Pantel;Patrick Nelissen;Jeffrey Moen;Eduard Tincu;Wayne Dunstan;Daniel Brown
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- light source;
- fault detection and classification;
- availability;
46.Metamaterials for enhancement of DUV lithography

机译：用于增强DUV光刻的超材料
- 作者：Andrew Estroff;Neal V. Lafferty;Peng Xie;Bruce W. Smith
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- surface plasmon resonance;
- attenuated total reflection;
- DUV;
- metamaterials;
- superlens;
- pupil filter;
- optical lithography;
47.Fast-Converging Iterative Gradient Decent Methods for High Pattern Fidelity Inverse Mask Design

机译：高图案逼真度反掩码设计的快速收敛迭代梯度下降方法
- 作者：Jue-Chin Yu;Peichen Yu
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- optical proximity correction;
- inverse lithography;
- image gradient;
48.The impact of resist model on mask 3D simulation accuracy beyond 40nm node memory patterns

机译：抗蚀剂模型对超过40nm节点存储图案的掩模3D模拟精度的影响
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- EMF;
- 3D mask;
- mask topography;
- lumped parameter resist model;
- full physical calibrated resist model;
49.A Simplified Reaction-diffusion System of Chemically-Amplified Resist Process Modeling for OPC

机译：OPC的化学放大抗蚀剂工艺建模的简化反应扩散系统
- 作者：Yongfa Fan;Moon-Gyu Jeong;Junghoon Ser;Sung-Woo Lee;Chunsuk Suh;Kyo-Il Koo;Sooryong Lee;Irene Su;Lena Zavyalova;Brad Falch;Jason Huang;Thomas Schmoeller
- 会议名称：《》 | 2010年
- OPC;
- modeling;
- chemically amplified resist;
50.Intra Field CD Uniformity Correction by Scanner Dose Mapper using Galileo~? Mask Transmission Mapping as the CDU Data Source

机译：扫描仪剂量映射器使用Galileo〜？进行场内CD均匀性校正掩码传输映射作为CDU数据源
- 作者：Gek Soon Chua;Chason Eran;Sia Kim Tan;Byoung IL Choi;Teng Hwee Ng;Poh Ling Lua;Ofir Sharoni;Guy Ben-Zvi
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- intra-field;
- reticle transmission;
- dose mapper;
- DOMA;
- CD CDU;
- galileo;
- scanner signature;
- mask transmission mapping;
51.Automatic numerical determination of lateral influence functions for fast-CAD

机译：快速CAD的横向影响函数的自动数值确定
- 作者：Marshal A. Miller;Kenji Yamazoe;Andrew R. Neureuther
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- pattern matching;
- boundary layers;
- edge effects;
- focus shift;
- kernel convolution;
- hotspot detection;
- mask 3D topology effect;
- process variation;
52.Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

机译：带有Streamlign平台的沉浸式扫描仪S620D的最新性能，可生成双图案
- 作者：Hirotaka Kohno;Yuichi Shibazaki;Jun Ishikawa;Junichi Kosugi
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- exposure tool;
- scanner;
- double patterning;
- overlay;
- throughput;
- modular structure;
- encoder;
- fluctuation;
53.Virtual Fab Flow for Wafer Topography Aware OPC

机译：晶圆拓扑感知OPC的虚拟工厂流程
- 作者：Hans-Juergen Stock;Lars Bomholt;Dietmar Krueger;James Shiely;Hua Song;Nikolay Voznesenskiy
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- optical lithography simulation;
- optical proximity correction;
- wafer topography;
54.The role of mask topography effects in the optimization of pixelated sources

机译：掩模形貌效应在像素化光源优化中的作用
- 作者：Vitaliy Domnenko;Bemd Kuechler;Thomas Muelders;Thomas Schmoeller;Hans-Juergen Stock;Georg Viehoever
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
55.LENS (Lithography Enhancement Towards Nano Scale) a European Project to support Double Exposure and Double Patterning technology development

机译：LENS（纳米级光刻增强技术）一项欧洲项目，旨在支持双曝光和双图案技术的发展
- 作者：Pietro Cantu;Livio Baldi;Paolo Piacentini;Joost Sytsma;Bertrand Le Gratiet;Stephanie Gaugiran;Patrick Wong;Hiroyuki Miyashita;Luisa Rita Atzei;Xavier Buch;Dick Verkleij;Olivier Toublan;Francesc Perez-Murano;David Mecerreyes
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
56.Topography-aware BARC optimization for double patterning

机译：地形感知的BARC优化以实现双图案
- 作者：Shijie Liu;Tim Fuehner;Feng Shao;Aliaksandr Barenbaum;Johannes Jahn;Andreas Erdmann
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- lithography simulation;
- bottom anti-reflective coating (BARC);
- waferstack optimization;
- double patterning;
57.Towards Ultimate Optical Lithography with NXT:1950i Dual Stage Immersion Platform

机译：借助NXT：1950i双阶段浸没平台实现极致光学光刻
- 作者：Tom Castenmiller;Frank van de Mast;Toine de Kort;Coen van de Vin;Marten de Wit;Raf Stegen
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- immersion lithography;
- exposure system;
- double patterning;
- 32-nm;
- 22-nm;
- overlay;
- throughput;
58.Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography

机译：激光带宽对45纳米和32纳米技术节点采用浸没式光刻的覆盖预算和成像的影响
- 作者：Umberto Iessi;Michiel Kupers;Elio De Chiara;Pierluigi Rigolli;Ivan Lalovic;G. Capetti
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- CD uniformity;
- overlay budget. Lens aberrations;
- laser bandwidth;
- image placement error;
59.Radial segmentation approach for contact hole patterning in 193 nm immersion lithography

机译：径向分割方法在193 nm浸没式光刻中进行接触孔图案化
- 作者：Moh Lung Ling;Gek Soon Chua;Sia Kim Tan;Cho Jui Tay;Chenggen Quan;Qunying Lin
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
60.Advanced imaging with 1.35 NA immersion systems for volume production

机译：带有1.35 NA浸没系统的先进成像技术可用于批量生产
- 作者：Igor Bouchoms;Jan Mulkens;Sander de Putter;Pieter Gunter;Roelof de Graaf;Marcel Beems;Erwin Verdurmen;Hans Jasper;Nils Dieckmann;Frank Bornebroek
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- immersion lithography;
- exposure systems;
- defects;
- overlay;
- CD control;
- low k1;
61.High Fluence Testing Of Optical Materials For 193-nm Lithography Extensions Applications

机译：用于193 nm光刻扩展应用的光学材料的高通量测试
- 作者：V. Liberman;S. Palmacci;G. P. Geurtsen;M. Rothschild;P. A. Zimmerman
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- high fluence;
- 193 nm lithography;
- optical materials;
- SiO_2;
- CaF_2;
62.Binary Mask Optimization for Forward Lithography based on Boundary Layer Model in Coherent Systems *

机译：相干系统中基于边界层模型的正向光刻二元掩模优化*
- 作者：Xu Ma;Gonzalo R. Arce
- 会议名称：《Conference on optical microlithography XXIII》 | 2010年
- binary mask;
- thick mask;
- forward lithography;
- coherent imaging;