NEURAL NETWORK METHODS AND APPARATUSES FOR MONITORING SUBSTRATE PROCESSING

摘要

Embodiments of the invention include methods and apparatuses that may be utilized to monitor substrate processing system. One embodiment is the data concerning the processing of a substrate in a semiconductor processing chamber in-data collecting assembly for acquiring training data related to may provide a device, the apparatus comprising a substrate disposed in the process chamber for obtaining in-situ; An electromagnetic radiation source; At least one of the measurement data to provide in-situ metrology module; And the neural network comprises a computer including software, the neural network software is adapted to model a relationship between the number of training data and other data related to substrate processing.