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Showerhead electrode design for semiconductor processing reactor
Showerhead electrode design for semiconductor processing reactor
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机译:半导体加工反应器的喷淋头电极设计
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摘要
By electrostatic clamping device comprising a compliant bit Lian material in contact with the surface of the showerhead electrode, it discloses an electrode assembly for improved heat transfer between the backing plate and the showerhead electrode semiconductor processing chamber. The showerhead electrode is detachably attached to the backing plate by a mechanical clamping device which engages with the outer periphery of the showerhead electrode. Electrostatically clamping apparatus height showerhead electrode and at the same time to improve the thermal conduction between the backing plate and the showerhead electrode.
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