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Showerhead electrode design for semiconductor processing reactor

机译:半导体加工反应器的喷淋头电极设计

摘要

By electrostatic clamping device comprising a compliant bit Lian material in contact with the surface of the showerhead electrode, it discloses an electrode assembly for improved heat transfer between the backing plate and the showerhead electrode semiconductor processing chamber. The showerhead electrode is detachably attached to the backing plate by a mechanical clamping device which engages with the outer periphery of the showerhead electrode. Electrostatically clamping apparatus height showerhead electrode and at the same time to improve the thermal conduction between the backing plate and the showerhead electrode.
机译:通过包括与喷头电极的表面接触的顺位钻头材料的静电夹紧装置,其公开了一种电极组件,用于改善背板和喷头电极半导体处理室之间的热传递。喷淋头电极通过与喷淋头电极的外周接合的机械夹紧装置可拆卸地附接到背板。静电夹紧装置可将花洒电极的高度调高,同时可提高背板与花洒电极之间的热传导。

著录项

  • 公开/公告号KR100916165B1

    专利类型

  • 公开/公告日2009-09-08

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20047001937

  • 发明设计人 딘드사라진더;렌즈에릭;

    申请日2002-07-31

  • 分类号H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-21 19:11:41

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