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METHOD FOR PREPARATION OF NANOCRYSTALLINE SILICON POWDERS

机译:纳米晶硅粉的制备方法

摘要

FIELD: chemistry.;SUBSTANCE: invention can be used in chemical, perfumery and textile industries. The initial silicon powder is fed with constant rate to the flow of plasma-supporting gas. The process of silicon evaporation with atomic vapour forming is carried out at the temperature of microwave plasma 4000 - 6000°C. The condensation of silicon atomic vapour is implemented in the flow of gas coolant fed to reactor perpendicularly to the mix flow of the atomic silicon and carrier gas. The resulting nanocrystalline silicon particles fell at first to the solid reflecting surface mounted in the reactor perpendicularly to the gas coolant flow and then to the receiver of ready nanocrystalline silicon powder.;EFFECT: claimed invention allows to obtain with yield more than 50% the crystalline nanodispersed silicon powders with particle size 2,0 - 30 nm and the crystalline nanodispersed powders with nanoparticles having the crystal nucleus and oxidised surface with the thickness of oxide film not exceeding several layers.;8 cl, 2 ex
机译:领域:化学。;物质:发明可用于化学,香料和纺织工业。初始硅粉以恒定的速度进料到等离子支撑气体的流动。具有原子蒸气形成的硅蒸发过程在微波等离子体4000-6000°C的温度下进行。硅原子蒸气的冷凝是在与原子硅和载气的混合流垂直的送入反应器的气体冷却剂流中实现的。所得的纳米晶硅颗粒首先落在垂直于气体冷却剂流的位置,落在反应器中的固体反射表面上,然后落入制备好的纳米晶硅粉的接收器中。粒径为2,0-30 nm的纳米分散硅粉,以及具有纳米粒子的结晶纳米分散粉末,该纳米粒子具有晶核和被氧化的表面,氧化膜的厚度不超过几层。; 8 cl,2 ex

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