Extensive plasma source for plasma polymerization in vacuum chamber, has flat electrode with base plate on which ribs are applied to plasma area, where outer rib has certain distance to outer edge of base plate

摘要

The extensive plasma source has a flat electrode (6), which is shielded with a dark space screen (7) against the vacuum chamber (1) and technological installations. The electrode has a base plate, on which ribs are applied to the plasma area. The dark space screen has a distance of 2-8 millimeter to the outer edge of the base plate. The outer rib has a certain distance to the outer edge of the base plate. Two electrodes are connected with a pole of a supply terminal (8) for a medium frequency. An independent claim is also included for a method for operating a plasma source.