首页> 外国专利> Diffractive optical element for operating wavelength for microelectronics, comprises binary structuring in subarea, and binary structuring comprises different strip densities at two positions of former subarea smaller than certain amount

Diffractive optical element for operating wavelength for microelectronics, comprises binary structuring in subarea, and binary structuring comprises different strip densities at two positions of former subarea smaller than certain amount

机译:用于微电子学的工作波长的衍射光学元件,包括在子区域中的二进制结构,并且二进制结构包括在前子区域的两个位置处的条带密度小于一定量的不同条带密度

摘要

The diffractive optical element comprises a binary structuring in a subarea. The binary structuring comprises different strip densities at two positions of the former subarea smaller than one divided by lambda. The binary structuring comprises different scanning ratios at the two positions. The difference of the different strip densities and the difference of the different scanning ratios amount to 0.1. An independent claim is included for a method for manufacturing a diffractive optical element.
机译:衍射光学元件在分区中包括二元结构。二元结构在前分区的两个位置上的不同条带密度小于一个分区除以λ。二进制结构在两个位置包括不同的扫描率。不同的条带密度之差和不同的扫描率之差总计为0.1。包括用于制造衍射光学元件的方法的独立权利要求。

著录项

  • 公开/公告号DE102007042672A1

    专利类型

  • 公开/公告日2009-03-26

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20071042672

  • 发明设计人 TRAUTER BASTIAN;HETZLER JOCHEN;

    申请日2007-09-10

  • 分类号G02B27/42;G02B5/18;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:36

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