Cleaning module, particularly for extreme-ultraviolet lithography apparatus, has supply for molecular hydrogen, where atomic hydrogen generating device is provided

摘要

The cleaning module has a supply (206) for molecular hydrogen, where an atomic hydrogen generating device is provided. A discharge (212) is provided for atomic or molecular hydrogen. The discharge has a curvature with a curvature angle of less than 120 degrees. The inner surface of the discharge is made of a material, where polytetrafluoroethylene or phosphoric acid is provided on silica. Independent claims are included for the following: (1) an extreme-ultraviolet lithography apparatus; and (2) a projection system for extreme-ultraviolet lithography apparatus.