Optical element i.e. plane-convex lens, for use in projection exposure system for immersion lithography, has water-repellent surface formed in element body, where surface is formed by micro structuring uncoated regions of element body

摘要

The optical element (1) has a water-repellent surface (6) formed in an element body (2), where the water-repellent surface is formed by micro structuring uncoated regions of the element body. Anti reflective coating (9) is provided at the optical element, where the water-repellent surface is formed adjacent to the coating. Microstructures (8) are formed in the optical element by etching the uncoated region of the element body. A conical shaped lens part is formed on a plane lens part. Independent claims are also included for the following: (1) a supporting device for a wafer (2) a projection exposure system for immersion lithography.