Layer's parameter value e.g. thickness value, determining method for e.g. solar cell, involves enclosing individual wavelength-dependent reflectivity per surface point on layer parameter value of object

摘要

The method involves capturing a set of images (B) of a layer i.e. anti-reflection layer, with different optical spectrum, using a charge-coupled device camera (2). Wavelength-dependent reflectivities of the layer are determined for multiple surface points (F) of the images, where a wave length region ranges between 450 and 700 nanometers. An individual wavelength-dependent reflectivity per a surface point is enclosed on a layer parameter value e.g. layer thickness value, of an object i.e. semiconductor wafer, at the surface points, where 256 to 10,000 surface points are evaluated per image. An independent claim is also included for a device for determining a parameter value of a layer of an object.