首页> 外国专利> Illuminating system for use in projection exposure system, has curved field generation module with optically active surfaces which are designed such that curved light-bundle is formed by stream deflection of incident light-bundle

Illuminating system for use in projection exposure system, has curved field generation module with optically active surfaces which are designed such that curved light-bundle is formed by stream deflection of incident light-bundle

机译:用于投影曝光系统的照明系统具有弯曲场产生模块,该弯曲场产生模块具有光学活性表面,该光学活性表面被设计为使得通过入射光束的流偏转形成弯曲光束。

摘要

The system (7) has a curved field generation module (15) with two optically active surfaces, which run steadily over an aperture along main extension direction, where the aperture is formed by the incident illumination light-bundle. The surfaces are designed such that a curved illumination light-bundle is formed by stream deflection of the incident illumination light-bundle. The field generation module comprises two optical components comprising optically operative surfaces, which run parallel to a bundle center stream (10). An independent claim is also included for a method for manufacturing a micro structured component with a projection exposure system.
机译:系统(7)具有弯曲场产生模块(15),该弯曲场产生模块(15)具有两个光学活性表面,所述光学活性表面沿着主延伸方向稳定地在孔上延伸,其中孔由入射照明光束形成。这些表面被设计成使得通过入射照明光束的流偏转形成弯曲的照明光束。场产生模块包括两个光学组件,所述两个光学组件包括光学操作表面,所述光学操作表面平行于束中心流(10)延伸。还包括具有投影曝光系统的微结构部件的制造方法的独立权利要求。

著录项

  • 公开/公告号DE102008041991A1

    专利类型

  • 公开/公告日2009-04-09

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20081041991

  • 发明设计人 FELDMANN HEIKO;EPPLE ALEXANDER;

    申请日2008-09-11

  • 分类号G03F7/20;G02B27/09;F21V5/00;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:04

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