Nanoelement i.e. catalyst nanoelement, realizing method, involves anistropic-etching nanoelement material layer on structured surface of substrate for defining contour of nanoelement at level of predetermined slot

摘要

The method involves structuring a surface of a substrate (100) in a projection (110) and a hollow (120) in order to define a predetermined slot (30), where the substrate has a principal plane. A nanoelement material layer is isotropic-deposited on the structured surface. The layer is anistropic-etched by a chemically inert ion beam for defining a contour of a nanoelement at the level of the predetermined slot.