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FILM THICKNESS MEASURING INSTRUMENT AND METHOD OF MEASURING FILM THICKNESS

机译:膜厚测定仪及膜厚测定方法

摘要

PPROBLEM TO BE SOLVED: To provide a film thickness measuring instrument and a method of measuring a film thickness for measuring a film thickness by a simple structure. PSOLUTION: The film thickness measuring instrument as one mode includes: a picture element row storage means for therein storing a picture element row corresponding to a lighted area in which light reflected by a surface of a transparent film or light reflected by an interface thereof is applied to a light receiving surface of a two-dimensional array light detector according to the position of a photo-transforming means; a focus height scanning means for scanning a focus height above a specimen; a measurement data storing means 101 for therein storing a signal based on light detected in the element row corresponding to the lighted area in association with the focus height; a reference function storing means 102 for therein storing a reference function referred to for finding the optical film thickness of the transparent film by the storing means 101 with the focus height used as a parameter, and a calculation means 105 for calculating the optical film thickness of the thin film by the least square method based on the reference function and measured data. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:提供一种膜厚测量仪器和一种用于测量膜厚的方法,用于通过简单的结构来测量膜厚。

解决方案:作为一种模式的膜厚测量仪器包括:像素行存储装置,用于在其中存储与其中由透明膜的表面反射的光或由界面反射的光的发光区域相对应的像素行。根据光转换装置的位置将其应用于二维阵列光检测器的光接收表面。聚焦高度扫描装置,用于扫描样品上方的聚焦高度;测量数据存储装置101,在其中存储与聚焦高度相关的,基于在与发光区域相对应的元件行中检测到的光的信号;参考函数存储装置102,其中存储参考函数,该参考函数用于通过存储装置101以聚焦高度作为参数来找到透明膜的光学膜厚度,以及计算装置105,用于计算光学膜厚度。根据参考函数和测量数据,通过最小二乘方法生成薄膜。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP2010237219A

    专利类型

  • 公开/公告日2010-10-21

    原文格式PDF

  • 申请/专利权人 LASERTEC CORP;

    申请/专利号JP20100131744

  • 发明设计人 KUSUSE HARUHIKO;AWAMURA NAOKI;

    申请日2010-06-09

  • 分类号G01B11/06;G01B11/02;G02B21;

  • 国家 JP

  • 入库时间 2022-08-21 19:05:51

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