SAMPLE STAGE FOR FOCUSED ION BEAM PROCESSING DEVICE, AND METHOD FOR MAKING TRANSMISSION TYPE ELECTRON MICROSCOPE PLANE-OBSERVED SEMICONDUCTOR THIN SAMPLE

摘要

PROBLEM TO BE SOLVED: To provide a sample stage for a focused ion beam processing device, using an easy method for inexpensively making a plane-observed semiconductor thin sample, and to provide a method using the same for making the transmission type electron microscope plane-observed semiconductor thin sample.;SOLUTION: The sample stage face has an inclined groove for holding a mesh on the sample stage face. With the emission of focused ion beams, a micro sample piece is cut out of a sample substrate, and separated and picked out by a microprobe, and then the mesh held in the inclined groove of the sample stage face is inclined so that the side face of the mesh is directed perpendicular to the focused ion beams. The micro sample piece adheres to the end face of the mesh so that its observed plane is directed perpendicular to the focused ion beams, and then the inclined sample stage is rotated 180° around the rotational axis. The focused ion beams are emitted to make the transmission type electron microscope plane-observed semiconductor thin sample.;COPYRIGHT: (C)2010,JPO&INPIT