首页> 外国专利> PROCESS CONDITION CALCULATION DEVICE, PROCESS CONDITION CALCULATION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESS CONDITION CALCULATION PROGRAM

PROCESS CONDITION CALCULATION DEVICE, PROCESS CONDITION CALCULATION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESS CONDITION CALCULATION PROGRAM

机译:工序条件计算装置,工序条件计算方法,半导体装置的制造方法以及工序条件计算程序

摘要

PROBLEM TO BE SOLVED: To calculate margin ranges of a process condition for a plurality of patterns to be processed in a lump.;SOLUTION: A difference calculation portion 17a calculates differences between target values of sizes of a plurality of patterns and measured values of sizes after a process of generating the plurality of patterns in a lump, a size variance calculation portion 17c calculates variances in size of the respective patterns when the process condition is changed based upon calculation results of the differences between the target values of the sizes of the respective patterns calculated by the difference calculation portion 17a and the measured values, and a process margin range calculation portion 17d calculates process margin ranges with respect to the plurality of patterns based upon calculation results of the size variances of the respective patterns calculated by the size variations calculation portion 17c.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:为一次要处理的多个图案计算处理条件的裕度范围;解决方案:差异计算部分17a计算多个图案的尺寸的目标值与尺寸的测量值之间的差异。在一次生成多个图案的处理之后,尺寸差异计算部分17c基于各个尺寸的目标值之间的差的计算结果,计算当改变处理条件时各个图案的尺寸的差异。由差值计算部分17a计算的图案和测量值,以及加工余量范围计算部分17d基于通过尺寸变化计算所计算出的各个图案的尺寸变化的计算结果,计算关于多个图案的加工余量范围。第17c部分;版权:(C)2010,日本特许厅和INPIT

著录项

  • 公开/公告号JP2010199420A

    专利类型

  • 公开/公告日2010-09-09

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20090044486

  • 发明设计人 ISHITANI MORIHARU;YOSHIDA KENJI;

    申请日2009-02-26

  • 分类号H01L21/027;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 19:03:29

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