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EVALUATION METHOD OF LATENT IMAGE INTENSITY DISTRIBUTION AND EVALUATION PROGRAM OF LATENT IMAGE INTENSITY DISTRIBUTION

机译:潜像强度分布的评估方法和潜像强度分布的评估程序

摘要

PROBLEM TO BE SOLVED: To permit evaluation of: the stability of resist configuration formed on a substrate; and a margin due to the configuration from an optical image.;SOLUTION: A latent image intensity distribution operating unit 1a calculates a latent intensity distribution in the direction of film thickness in a resist film, based on an exposure condition and a mask pattern; an evaluation position operating unit 1b calculates an evaluation position in the direction of film thickness in the resist film based on the latent intensity distribution calculated by the operating unit 1a; and a pattern evaluation unit 1c evaluates the feature of a pattern formed on the resist film based on the latent intensity of the evaluation position calculated by the evaluation position operating unit 1b.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:允许评估:在基板上形成的抗蚀剂构型的稳定性;解决方案:潜像强度分布运算单元1a根据曝光条件和掩模图案,计算抗蚀剂膜在膜厚方向上的潜像强度分布。评价位置运算部1b根据由运算部1a算出的潜伏强度分布,算出抗蚀剂膜的膜厚方向上的评价位置。图案评价部1c根据由评价位置运算部1b计算出的评价位置的潜伏性来评价在抗蚀剂膜上形成的图案的特征。COPYRIGHT:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2010021428A

    专利类型

  • 公开/公告日2010-01-28

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20080181625

  • 发明设计人 TAKAHASHI MASANORI;TANAKA SATOSHI;

    申请日2008-07-11

  • 分类号H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 19:02:23

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