PROBLEM TO BE SOLVED: To improve the durability of a tool used to hold a body to be formed during manufacture of a compound semiconductor using organic metal vapor phase epitaxy.;SOLUTION: In an MOCVD device which forms a layer of a group III nitride semiconductor on a formed surface of a compound semiconductor substrate by organic metal vapor phase epitaxy, a substrate holder 30 which holds the compound semiconductor substrate comprises a main portion 31 composed of SiC, and a coating portion 32 made of Si3N4 and provided covering at least a part of an outer peripheral surface of the main portion. The compound semiconductor substrate is fitted in a recessed portion 30 with the formed surface out, the substrate holder 30 is fitted rotatably in a reaction container of the MOCVD device, and a raw material gas of the group III nitride semiconductor is supplied into the reaction container to form a layer of the group III nitride semiconductor.;COPYRIGHT: (C)2011,JPO&INPIT
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机译:解决的问题:在使用有机金属气相外延制造化合物半导体的过程中,提高用于固定待形成物体的工具的耐用性;解决方案:在MOCVD装置中形成III族氮化物半导体层通过有机金属气相外延在化合物半导体衬底的形成表面上,保持化合物半导体衬底的衬底保持器30包括由SiC构成的主体部分31和由Si 3 Sub制成的涂覆部分32。 > N 4 Sub>,并覆盖主体的外周面的至少一部分。将化合物半导体衬底装配在凹入部分30中,使形成的表面朝外,衬底保持器30可旋转地装配在MOCVD装置的反应容器中,并且将III族氮化物半导体的原料气体供应到反应容器中。形成III族氮化物半导体层。版权所有:(C)2011,JPO&INPIT
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