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SURFACE-MODIFIED SUBSTRATE, METHOD FOR PRODUCING SURFACE-MODIFIED SUBSTRATE, AND SYSTEM FOR PRODUCING SURFACE-MODIFIED SUBSTRATE
SURFACE-MODIFIED SUBSTRATE, METHOD FOR PRODUCING SURFACE-MODIFIED SUBSTRATE, AND SYSTEM FOR PRODUCING SURFACE-MODIFIED SUBSTRATE
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机译:表面改性的基质,生产表面改性的基质的方法和系统,用于生产表面改性的基质
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摘要
PROBLEM TO BE SOLVED: To provide a surface-modified substrate provided with a modified layer disposed on the substrate through a light-non-transmitting layer, to provide a method for efficiently producing the same without relating to a use thereof, and to provide a system for producing the same.;SOLUTION: The method for producing the surface-modified substrate 1 includes a step of patterning a light-non-transmitting layer 12 on the surface 11a of a substrate 11 having a light transmitting property, a step of coating the patterned surface of the light-non-transmitting layer 12 with a modifying agent to dispose a modified layer 13, a step of coating the modified layer 13 with a positive photoresist 14, a step of masking the patterned light-non-transmitting layer 12, exposing the positive photoresist 14 to light from the back side 11b of the substrate 11 and then developing the product to pattern the resist layer 14' to expose prescribed sites of the modified layer 13, a step of removing the exposed modified layer 13, and then a step of removing the resist layer 14' left on the substrate 11.;COPYRIGHT: (C)2010,JPO&INPIT
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