Roll-to-roll plasma-enhanced chemical vapor deposition of a barrier layer containing silicon and carbon

摘要

The present invention provides methods and processes for forming a barrier layer on the flexible substrate. Continuous roll-to-roll process may include using the at least one roller is configured to direct the substrate through the process chamber and process chamber to provide a substrate. By exposure to a plasma containing a carbon-containing precursor gases and silicon, at least a portion of the substrate in the process chamber, the process involves depositing in the vicinity of the substrate a barrier layer. The present invention, structural units SiC: Target further comprising a barrier layer based on H, a flexible substrate coated. The barrier layer has a low porosity and high density. Furthermore, the barrier ^{layer, 10 -2 ~10} -3 g. shows the water vapor transmission rate (WVTR) low in the range of m ^-2 d ^-1, it is appropriate to use transmittance is very low.