In the nonuniformity defective inspection manner which inspects the nonuniformity defect which is generated in

摘要

A mura defect inspecting apparatus 10 inspects the mura defect occurring in a repetitive pattern which is on a photomask 50 , and which has a large number of unit patterns that are regularly arranged. The apparatus has a light receiver 13 , an analyzing device 14 , and an evaluating device 15 . The light receiver and the analyzing device detect the mura defect occurring in the repetitive pattern of the photomask. The evaluating device compares mura defect detection data of the mura defect of the photomask which are detected by the light receiver and the analyzing device, with plural pseudo mura defect detection data, thereby evaluating the mura defect of the photomask. The pseudo mura defect detection data are correlated respectively with plural pseudo mura defects to which intensities of mura defects occurring in a predetermined repetitive pattern are allocated with being stepwisely changed, for respective kinds of the mura defects.