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In the photodiode array where photodiode array, the photodiode is formed

机译:在其中光电二极管阵列的光电二极管阵列中,形成了光电二极管

摘要

PROBLEM TO BE SOLVED: To provide a photodiode array capable of satisfactorily reducing the generation of any cross-talk even at the time of collecting electrodes or wiring at one face side. SOLUTION: In a photodiode array 1, a plurality of p type semiconductor layers 3 are arranged on a surface 2s of an n- type semiconductor substrate 2, and light to be detected is made incident from a back face 2u side of the semiconductor substrate 2. Then, an n+ type channel stopper layer 4 having impurity density higher than that of the semiconductor substrate and a trench part 10 arranged so that the periphery of each p type semiconductor layer 3 can be roughly surrounded, and extended from the channel stopper layer 4 to the back face 2u side are arranged on one face side of the semiconductor substrate 2. A trench non-existing part 9 where the trench part 10 does not exist is formed in at least one part of the periphery of each p type semiconductor layer 3, and sites 4c corresponding to the adjacent semiconductor layers 3 of the channel stopper layer 4 are continuously formed through each trench non-existing part 9.
机译:解决的问题:提供一种即使在一个面侧收集电极或布线时也能够令人满意地减少任何串扰的产生的光电二极管阵列。解决方案:在光电二极管阵列1中,多个p型半导体层3布置在n型半导体衬底2的表面2s上,并且要检测的光从半导体衬底2的背面2u侧入射。然后,具有比半导体衬底的杂质密度高的杂质密度的n +型沟道阻挡层4和被布置为使得每个p型半导体层3的外围可以被大致包围的沟槽部分10,并且从沟道阻挡层4延伸。在半导体基板2的一面侧配置有背面2u侧的面。在各p型半导体层3的周缘的至少一部分形成有不存在沟槽部10的沟槽不存在部9。穿过沟道不存在部分9连续地形成与沟道阻挡层4的相邻半导体层3相对应的部位4c。

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