Dual magnetron sputtering power source and magnetron sputtering device

摘要

Being the dual magnetron sputtering power source which is used for the magnetron sputtering device which operates with dual magnetron sputtering mode, at least has the 1st and 2nd sputtering cathode, in order the description above to which at the same time each one corresponds attendant upon the respective description above the 1st and 2nd cathode, to control the reaction gas flow to the 1st and 2nd cathode, the 1st flow control valve which conforms (12) and the 2nd flow control valve (14) through, having the expedient in order to supply reaction gas flow the aforementioned 1st cathode (1) and the 2nd cathode (4) vis-a-vis respectivelyThe aforementioned power source, in order to acquire the voltage feedback signal which corresponds to the specification which is set the aforementioned reaction gas flow to the respective flow control valve which the aforementioned respective cathode accompanies by adjusting expedient and the aforementioned respective flow control valve which send the feedback pertaining to the excessive voltage which occurs with the aforementioned cathode the description above the 1st and 2nd cathode respectively concerning, signal is controlled together, from the aforementioned respective cathode concerning the aforementioned cathode, the control circuit which adjusts the aforementioned flow valve and, is the dual magnetron sputtering power source which it has. In addition, the magnetron sputtering device where this kind of power source is installed is claimed.