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The chemical vapor phase evaporation device and its method of having the shower head which adjusts the jet velocity of the reaction vapor positively
The chemical vapor phase evaporation device and its method of having the shower head which adjusts the jet velocity of the reaction vapor positively
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机译:化学汽相蒸发装置及其方法,其喷淋头可以积极地调节反应蒸汽的喷射速度
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摘要
This invention the chemical vapor phase evaporation which has the shower head which supplies the reaction vapor of various types and the purge vapor of 1 kinds on the baseplate (CVD) regards the device and method. With this invention, plural reaction vapor shower head modules are placed on one purge vapor shower head module. As for the respective reaction vapor, passing the shower head when it is not mixed mutually, because it is injected from the base of the shower head, the vapor phase similar reaction happening inside the aforementioned shower head, or the particle composure which is not desired happening is prevented. In addition, the purge vapor being injected from the base of the aforementioned shower head, in order to form the protective curtain, spread to opposite direction of the reaction vapor and the particle composure in the base of the shower head is prevented. The respective reaction vapor is mixed inside the respective injection support vapor and the shower head which are one kind of inert gas, but jet velocity of respective reaction vapor is controlled positively by the flow per unit time of the injection support vapor which is mixed. In addition, this invention, in order for the reaction vapor not to cause condensation or thermal decomposition inside the shower head, offers the device and the method of maintaining the shower head in appropriate temperature making use of the cooling jacket. Selective figure Figure 15
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