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Plasma generation support device in the plasma generating device and atmospheric pressure at atmospheric pressure

机译:等离子体产生装置中的等离子体产生支持装置和大气压下的大气压

摘要

PROBLEM TO BE SOLVED: To provide a plasma generation method in atmospheric pressure capable of relatively easily igniting and keeping plasma in the atmospheric pressure without needing facilities for pressure reduction; and to provide its device.;SOLUTION: An antenna member having conductivity is arranged in a processing space 20a surrounded by a conductive material with the inside set at atmospheric pressure so that its length in the processing space is set to a predetermined length Lver and one end in the processing space is grounded to the conductive material; and microwaves are radiated into the processing space to generate plasma. The processing space 20a surrounded by the conductive material with the inside set at atmospheric pressure, the antenna member 30 and a microwave generation means 10 are provided; the microwave generation means 10 radiates microwaves into the processing space 20a; and the antenna member 30 has conductivity, has a nearly columnar shape, and is so installed that the one end thereof in the processing space is grounded to the conductive material and the length thereof in the processing space 20a is set to the predetermined length Lver.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种在大气压下能够较容易地点燃并保持等离子体在大气压下而不需要减压设备的等离子体产生方法;解决方案:具有导电性的天线部件布置在处理空间20a中,该处理空间20a由导电材料围绕,并且内部设置为大气压,从而将其在处理空间中的长度设置为预定长度Lver,并且将其设置为预定长度Lver。处理空间的一端接地至导电材料。微波辐射到处理空间中以产生等离子体。设置有内部被设定为大气压且被导电材料包围的处理空间20a,天线部件30和微波产生单元10。微波产生装置10向处理空间20a内照射微波。天线部件30具有导电性,呈大致圆柱状,并且被安装成使得其在处理空间中的一端接地到导电材料,并且其在处理空间20a中的长度被设置为预定长度Lver。 ;版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4531451B2

    专利类型

  • 公开/公告日2010-08-25

    原文格式PDF

  • 申请/专利权人 庄司 多津男;

    申请/专利号JP20040172702

  • 发明设计人 庄司 多津男;白岩 慎一郎;

    申请日2004-06-10

  • 分类号H05H1/24;A63H33/22;G09B23/06;H05H1/46;

  • 国家 JP

  • 入库时间 2022-08-21 19:00:16

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