Nanoimprint technology flexibility is improved with respect to mold feature and alignment

摘要

Since by forming a metallization on the basis of the imprint technology and the trench and via openings are formed in common, it is possible to omit the additional alignment processes of at least one as obtained in conventional processing techniques , it is possible to substantially reduce the complexity of the process. Furthermore, effectiveness and flexibility of imprint lithography is improved by providing the imprint mold that is appropriately designed, whereby, from the standpoint of resistance reliability against electromigration, the metallization which is finally obtained I also improved the performance of the structure.