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FILM THICKNESS MEASURING INSTRUMENT AND FILM THICKNESS MEASURING METHOD

机译:膜厚测定仪及膜厚测定方法

摘要

PROBLEM TO BE SOLVED: To provide a film thickness measuring instrument measuring a film thickness with higher accuracy.;SOLUTION: A modeling part 721A renews film thicknesses d1 of a first layer in order according to a parameter renewing order from a fitting part 722A to renew a function representing theoretical reflectivity according to film thicknesses d1 after the renewal. Further, the modeling part 721A repeatedly calculates theoretical reflectivity (spectrum) at respective wavelengths according to the renewed function. Under such a procedure, the film thicknesses d1 of the first layer are determined by fitting. If the fitting does not converge within a stipulated number of times, the film thicknesses d1 of the first layer are determined by using Fourier transformation.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种能够以更高的精度测量膜厚的膜厚测量仪。解决方案:建模部件721A根据参数更新顺序更新第一层的膜厚d 1 。根据更新后的膜厚d 1 ,从装配部722A命令更新代表理论反射率的函数。此外,建模部721A根据更新后的函数,反复计算各个波长下的理论反射率(光谱)。在这样的程序下,通过拟合确定第一层的膜厚度d 1 。如果配件在规定次数内未收敛,则使用傅立叶变换确定第一层的膜厚d 1 。COPYRIGHT:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2010002327A

    专利类型

  • 公开/公告日2010-01-07

    原文格式PDF

  • 申请/专利权人 OTSUKA DENSHI CO LTD;

    申请/专利号JP20080162046

  • 发明设计人 SAWAMURA YOSHIMI;FUJIMORI MASAYOSHI;

    申请日2008-06-20

  • 分类号G01B11/06;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 18:59:27

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