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Creation manner of the basic plate for intaglio process which possesses the superfine belt, and creation manner of the basic plate for basic plate null

机译:具有超细带的凹版印刷制版基板的制作方式及制版无效的基板的制作方式

摘要

PPROBLEM TO BE SOLVED: To provide a method for making an intaglio printing original plate having an ultra-thin line and to provide an intaglio printing original plate by the method. PSOLUTION: The method includes: a first step of applying a positive photoresist on a printing primitive plate to a predetermined thickness; a second step of covering the photoresist of the primitive plate with a photomask having a predetermined pattern drawn thereon; a third step of irradiating the photoresist through the photomask with UV rays or electron beams under predetermined conditions to cure the irradiated part of the photoresist; and a fourth step of releasing the photomask and removing the non-irradiated portion of the photoresist under predetermined conditions. The method is characterized in that: the line width of the image drawn on the photomask is 10 to 30 m; the predetermined thickness of the photoresist is 1 to 30 m; and the irradiation period is 15 to 200 sec, which is 5 to 20 times in terms of a practical scale as the conventional standard irradiation period. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:提供一种制造具有超细线的凹版印刷原版的方法,并提供通过该方法的凹版印刷原版。

解决方案:该方法包括:第一步,在印刷原板上将正性光致抗蚀剂施加至预定厚度;第二步骤是用在其上绘制有预定图案的光掩模覆盖原始板的光致抗蚀剂;第三步,在预定条件下用紫外线或电子束通过光掩模辐照光致抗蚀剂,以固化光致抗蚀剂的辐照部分;第四步骤是在预定条件下释放光掩模并去除光致抗蚀剂的未照射部分。该方法的特征在于:在光掩模上绘制的图像的线宽为10至30m;光刻胶的预定厚度为1至30m。照射时间为15〜200秒,是实用规模的5〜20倍。

版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4472512B2

    专利类型

  • 公开/公告日2010-06-02

    原文格式PDF

  • 申请/专利权人 問井 孝宣;

    申请/专利号JP20040376541

  • 发明设计人 問井 孝宣;

    申请日2004-12-27

  • 分类号G03F7;G03F7/20;G03F7/36;B41C1/05;

  • 国家 JP

  • 入库时间 2022-08-21 18:58:51

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