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Semiconductor wafers, a device for recovering the liquid droplets to measure the impurities present on the surface of a substrate such as a liquid crystal board

机译:半导体晶片,一种用于回收液滴以测量存在于基板(如液晶板)表面上的杂质的装置

摘要

PROBLEM TO BE SOLVED: To provide a substrate inspecting apparatus capable of improving further its measuring accuracy.;SOLUTION: Instead of a conventional substrate inspecting apparatus for moving a substrate while sticking a liquid drop on it for its inspection, the substrate inspecting apparatus has a substrate rotating appliance for so holding the substrate horizontally as to rotate it around a vertical rotating shaft, the recovery jig of a cylindrical member having its inner space capable of storing a liquid drop therein and provided with a through hole in its lower portion which makes its inner space communicate with its atmospheric space, and a driving appliance capable of moving horizontally the recovery jig while so holding the recovery jig as to contact with the surface of the substrate the liquid drop stored in its inner space and exposed to the through hole. Further, the recovery jig is so moved relatively to the substrate as not to extrude the liquid drop from the specific region of the surface of the substrate.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种能够进一步提高其测量精度的基板检查装置;解决方案:代替传统的基板检查装置在使液滴附着在其上以进行检查的同时移动基板,该基板检查装置具有基板旋转器具,用于使基板水平地保持以使其绕竖直旋转轴旋转,该圆柱形元件的回收夹具的内部空间能够在其中存储液滴,并且在其下部设有通孔,该通孔使内部空间与其大气空间连通,并且驱动装置能够水平移动回收夹具,同时保持回收夹具使其与基板的表面接触,从而使存储在其内部空间中的液滴暴露于通孔。此外,回收夹具相对于基材移动,以免液滴从基材表面的特定区域挤出。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP4516328B2

    专利类型

  • 公开/公告日2010-08-04

    原文格式PDF

  • 申请/专利权人 有限会社NAS技研;

    申请/专利号JP20040045332

  • 发明设计人 大金 昭宏;櫻井 良夫;

    申请日2004-02-20

  • 分类号H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 18:58:46

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