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Microstructure and a manufacturing method thereof with a functionalized surface by localized deposition of thin layer
Microstructure and a manufacturing method thereof with a functionalized surface by localized deposition of thin layer
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机译:通过局部沉积薄层而具有功能化表面的微结构及其制造方法
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摘要
Electromechanical microstructure with a first portion known as the (102) mechanical parts made of a first conductive material and a (1), whereas elastically having (2) the exposed surface and the thickness on the side electromechanical microstructure which includes a deformable zone (104), and with the first organic film having a thickness that is present on the entire surface (2) the exposed surfaces of the deformable zone (104) to the other side (4) structure in (1), The thickness of the membrane (4) of the first variation of 5% or more compared to the response (104) deformable zone of the bare elastic response (104) deformable zones with the first film (4) either a thickness not, or, the thickness of the membrane (4) of the first electromechanical microstructure is characterized by less than 10 times the thickness of the deformable zone (104).
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