nahutokinonjiajidosuruhonesuteru which features that it is , the 1,2 naphthoquinone 2 diazido 5 sulfonic acid ester or 1,2 naphthoquinone 2 diazido 4 sulfonic acid ester of each phenol compound which is chosen from the phenol

摘要

PPROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition with high sensitivity and high resolution wherein films are hardly decreased, a pattern form is not broken, and scums of the photosensitive resin composition in an exposed area do not remain. PSOLUTION: The positive type photosensitive resin composition comprises (B) 1-50 pts.wt. of a 1, 2-naphthoquinone-2-diazide-5-sulfonic acid ester and/or a 1, 2-naphtoquinone-2-diazide-4-sulfonic acid ester of a phenol compound represented by general formula (1) based on (A) 100 pts.wt. of an alkali-soluble resin. PCOPYRIGHT: (C)2005,JPO&NCIPI