Devices prepared incidence mirrors, grazing lithographic apparatus including an incident mirror, grazing method for providing incidence mirror, a method for enhancing the EUV reflection of grazing incidence mirrors, manufacturing method and device whereby a grazing

摘要

A grazing incidence mirror includes a mirror substrate and a mirror surface layer, the mirror surface layer including a first layer and a second layer, the first layer being positioned between the mirror substrate and the second layer. The first layer includes a material selected from the group of Mo, Nb and combinations thereof, and the second layer includes a material selected from the group of B, C, BSUB4/SUBC, SiC and combinations thereof. Such a grazing incidence mirror can be used in lithographic apparatus and in device manufacturing methods and provides a reflectivity that may be larger than state of the art grazing incidence mirrors based on Ru.