首页> 外国专利> In order that it is provided on the shirikonchitsu conversion film and the said shirikonchitsu conversion film which

In order that it is provided on the shirikonchitsu conversion film and the said shirikonchitsu conversion film which

机译:为了将其设置在shirikonchitsu转换膜和上述shirikonchitsu转换膜上,

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor light-emitting device and its manufacturing method that use a ZnO-family compound semiconductor, are a vertical type that can take out an electrode from the upper and lower surfaces of a chip, having superior crystallinity of a semiconductor layer and high light emission efficiency, at the same time, which do not use a sapphire substrate, and are convenient in a manufacturing process and use. ;SOLUTION: A silicon nitride film 2 is provided on the surface of a silicon substrate 1, at least n-type and p-type layers 3 and 4 and 6 and 7 consisting of a ZnO-family compound semiconductor are provided on the silicon nitride film 2, and a semiconductor lamination part 11 is laminated, so that a light emission layer is formed. The silicon nitride film 2 is preferably subjected to heat treatment under atmosphere, where nitrogen as an ammonia gas exists for forming.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:为了提供一种使用ZnO族化合物半导体的半导体发光器件及其制造方法,是一种能够从芯片的上表面和下表面取出电极的垂直型,其具有优异的结晶度。同时不使用蓝宝石衬底的半导体层和高发光效率,并且在制造过程和使用中方便。 ;解决方案:在硅衬底1的表面上提供氮化硅膜2,在氮化硅上至少提供由ZnO族化合物半导体组成的n型和p型层3和4、6和7膜2被层叠,并且半导体层叠部11被层叠,从而形成发光层。氮化硅膜2优选在大气中进行热处理,在大气中存在作为氨气的氮气以形成。;版权所有:(C)2001,JPO

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号