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Evaporation source for vapor phase evaporation, production method of radiation image transform panel, and radiation image transform panel

机译:用于气相蒸发的蒸发源,放射线图像变换面板的制造方法以及放射线图像变换面板

摘要

This invention offers, when producing the thin film with vapor phase vapor deposition method, bumping (the splash) due to production method of the radiation image transform panel, and the radiation image transform panel which are produced the evaporation source for vapor phase evaporation which makes that the thin film which is not the membrane defect is produced possible, making use of that. As this expedient, you remove from the crucible and it is possible and to the crucible it is constituted from the cover, and the aforementioned crucible and that heating expedient which possess the ostium which is communicated it features the evaporation source for vapor phase evaporation where the open part of the aforementioned ostium is a side wall of the aforementioned cover.
机译:本发明在通过气相蒸镀法制造薄膜时,提供由放射线图像变换面板的制造方法所产生的隆起(飞溅),以及放射线图像变换面板,该放射线图像变换面板是通过气相蒸发用的蒸发源而制作的。由此,可以制造不是膜缺陷的薄膜。作为这种权宜之计,您可以从坩埚中取出,并且有可能由盖来构成坩埚,并且上述坩埚和拥有连通的开口的加热权宜器具有气相蒸发的蒸发源,其中上述口的开口部分是上述盖的侧壁。

著录项

  • 公开/公告号JPWO2008120589A1

    专利类型

  • 公开/公告日2010-07-15

    原文格式PDF

  • 申请/专利权人 コニカミノルタエムジー株式会社;

    申请/专利号JP20090507463

  • 发明设计人 笠井 惠民;伊佐 寛;

    申请日2008-03-22

  • 分类号C23C14/24;C09K11/00;C09K11/02;C09K11/61;G21K4/00;

  • 国家 JP

  • 入库时间 2022-08-21 18:57:55

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