Formation method of amorphous carbon membrane, amorphous carbon membrane and multilayer resist membrane, production method and computer legible memory medium of semiconductor device.

摘要

As carbon monoxide and the inert gas are supplied inside process and the processing container which arrange the baseplate on the lower part electrode the upper electrode and the lower part electrode making use of the plasma CVD device of the parallel flat type which distribution facilities is done inside the processing container, impressing high-frequency power at least in the upper electrode, it disassembles carbon monoxide by generating the plasma, accumulates the amorphous carbon on the baseplate and it possesses with the process which forms a membrane. It is desirable for the upper electrode to be the carbon electrode.