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The photo-oxide generating agent, the chemical amplification resist constituent, and pattern formation mannered null general formula
The photo-oxide generating agent, the chemical amplification resist constituent, and pattern formation mannered null general formula
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机译:光致氧化物发生剂,化学增幅抗蚀剂成分和图案形成方式无效
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摘要
A chemically amplified photo-resist contains a photoacid generator for changing the solubility of resin after exposure to 130-220 nanometer wavelength light, and the photoacid generator contains two kinds of sulfonium salt compound expressed by general formulae [1] and [2] so that the chemically amplified photo-resist is improved in resolution, sensitivity and smoothness on side surfaces of a transferred pattern.
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