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METHOD FOR PRODUCING METAL NITRIDE FILM, METAL OXIDE FILM, METAL CARBIDE FILM OR FILM OF COMPOSITE MATERIAL THEREOF, AND PRODUCTION APPARATUS THEREFOR
METHOD FOR PRODUCING METAL NITRIDE FILM, METAL OXIDE FILM, METAL CARBIDE FILM OR FILM OF COMPOSITE MATERIAL THEREOF, AND PRODUCTION APPARATUS THEREFOR
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机译:制备金属氮化物膜,金属氧化物膜,金属碳化物膜或复合材料膜的方法及其生产装置
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摘要
Disclosed is a production apparatus for producing on a substrate a film selected from the group consisting of a metal nitride film, a metal oxide film, a metal carbide film and a film of composite material thereof. The production apparatus comprises a substrate holder for supporting the substrate; a chamber capable retaining a reduced pressure therein; an inert gas supply section that supplies inert gas into the chamber; a source gas supply section that supplies a source gas containing atoms selected from the group consisting of nitrogen atoms, oxygen atoms and carbon atoms into the chamber; a target containing a constituent element of a metal film to be formed on the substrate; a pair of sputtering electrodes for sputtering the target using the inert gas supplied from the gas supply section as a sputtering gas; and a metal catalyst which generates radicals by activating the source gas and which is placed outside a plasma region formed by the pair of sputtering electrodes.
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