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CUT FIRST METHODOLOGY FOR DOUBLE EXPOSURE DOUBLE ETCH INTEGRATION
CUT FIRST METHODOLOGY FOR DOUBLE EXPOSURE DOUBLE ETCH INTEGRATION
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机译:双重曝光双曝光集成的第一方法学
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摘要
A multiple etch process for forming a gate in a semiconductor structure in which a cut area is first formed followed by the forming of the gate conductor lines.
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